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              round pillars
      polarization insenstive       ![]()
          rectangular pillars
      for circular polarization ![]()
          cross-type pillar
x-arm length TM polarization y-arm length TE polarization       ![]()     heat map plot showing     transmission vs pillar height     calculated using RCWA     Pillar height selected for     good transmission across     pillar radii ![]()     phase vs pillar radius     calculated using RCWA     Pillars from 0-to-2pi phase     are selected and saved in     a meta-atom library     to use as building blocks     for metasurface layout ![]()
  englarged GDS mask showing
  meta-atoms placed at positions   in the metasurface to minimize   target wavefront error ![]()
    rectangular and cross-shape
    meta-atoms placed at each     position on the surface     according to the phase with     the lowest target wavefront     error       ![]()
GDS mask showing metasurface
layout with weighted optimization to split TE and TM polarization
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PlanOpSim Metalens Simulation and Design Software
Metalenses are increasingly replacing conventional lenses for imaging, sensing and display applications, because they are flat lenses with many degrees of design freedom that can simplify and reduce the size of optical systems. Metalenses can control the amplitude, phase and polarization of light. They can be designed for large FOV, achromatic correction, polarization sensing and control and complex wavefront patterns. There are several ways to fabricate metalenses, depending on the application, the materials and the production facilities. E-beam lithography by scanning an electron beam is typically used for low-volume laboratory applications. Photo lithography, using a mask, similar to semiconductor manufacturing, is for high volume applications. Nano-imprint lithography is a pattern transfer method which mechanically creates a pattern in a soft material, such as a polymer. The material is then cured by UV light.
Easy to use
Optical engineers can work efficiently with PlanOpSim metalens simulation and design software,
because it was developed specifically for metalens applications. The workflow is logical and intuitive for metalens
simulation and design.
PlanOpsim is the only optical design software that includes a graphical user interface for all the steps in designing metalenses. This includes: creating meta-atoms and substrate structures, storing them in libraries, creating near-field or far-field targets, laying out metasurfaces, optimizing final designs and exporting GDSII fabrication files. It is easier to learn and use than software with scripts or a combination of scripts and a graphical interface.     Contact us to request a competitive workflow comparison Both new and experienced metalens designers can easily modify configurations (e.g. materials, pillar shapes, dimensions, incident light) for performance comparison, and they can dynamically change multiple variables for optimization, tolerancing and manufacturability. PlanOpSim is your source for both software and expert support by a team that specializes in metalens design and applications.
Two program modules.
PlanOpSim software includes two program modules.
The MetaCell program module is for creating pillar structures and substrates, creating meta-atom groups from pillars, storing meta-atom groups in a library for metasurface layout. The MetaComponent program module is for creating a near-field or far-field wavefront target, creating metasurface designs, optimizing the final design, laying out the metasurface using a meta-atom group from the library and exporting a GDSII fabrication file. Features of PlanOpSim MetaCell program module     Create subwavelength pillars and meta-atom pillar groups.     Metasurface pillar shapes included:         round - polarization insensitive         rectangular - polarization sensitive by rotation         cross - more polarization control by rotation and x, y dimensions     Full wave RCWA Maxwell solver to calculate the phase and transmission         of meta-atoms     Plot heat map showing transmission (in red) vs pillar height and radius         Choose pillar height for maximum transmission across a range         of pillar sizes and for practical fabrication height.     Plot phase vs pillar radius to select pillars from 0-to-2pi phase         to include in a meta-atom pillar group     Store meta-atom pillar groups in a library for convenient metasurface         layout, as described in the next section on the MetaComponent         program module.     The library can contain meta-atom pillar groups with different pillar         shapes for designing complex, multifunction wavefront targets,         for polarization control and for achromatic design by dispersion         engineering.     Ask us for use cases describing polarization control and dispersion         engineering.     Contact us to request RCWA vs FDTD speed and accuracy comparison. Features of PlanOpSim MetaComponent program module     The MetaComponent program is for importing near-field and far-field     targets, conveniently laying out metasurface structures using the     meta-atom library created in the MetaCell program, exporting GDSII     fabrication files and exporting metasurface designs to Zemax.     Near-field design - two ways:         Input Zemax wavefront surface response (binary2 surface)         Input near-field phase as an analytical expression, in a             Python script to create a customized wavefront     Far-field design - and IFTA         For far-field design a target pattern can be imported, such as a JSON             image file.         Iterative Fourier Transform Algorithm (IFTA) is used to create             metasurface phase designs from a far-field pattern.             IFTA starts by creating a random phase distribution             in the near-field, based on far-field amplitude input.             The projected pattern is evaluated against the target, and each             iteration improves the phase design until a desired pattern             is developed.             It takes PlanOpSim just seconds to develop, evaluate and improve             mutiple metasurface phase designs.     Parameter sweep         The Parameter Sweep in PlanOpSim is used to optimize designs for         best performance, based on design criteria, and for fabrication         tolerance analysis.             Minimum and maximum ranges for each parameter can be             specified, as well as the number of steps to vary in each range.             Parameters can be varied linearly or randomly.             The Parameter Sweep also makes it easy to see how performance             changes when varying such parameters as wavelength             and angle of incidence.             Results, including spot size, spot location and wavefront can be             shown quickly, and they can be viewed dynamically using a             separate slider bar for each variable.     Export GDSII fabrication files         The finished metasurface design is used to export a GDSII             fabrication file.         Shown on the left are three examples of GDSII masks.             round polarization-insensitive pillars             both rectangular and cross pillars             weighted optimization to split TE and TM polarization                 and focal spot locations         Click on each image to enlarge it.     Zemax Import         Importing Zemax binary 2 files into PlanOpSim for metalstructure             applications extends Zemax ray tracing to fully vectorial physical             optics modeling and physical structure designs. Types of User Licenses PlanOpSim software is available for online operation or with a dongle for     local operation. User licenses can either be permanent or renewable subscriptions. Subscription user licenses can reduce initial cost, offer longer, more     thorough software evaluations or provide practical solutions     for short-term projects. Subscription user licenses can be converted to permanent licenses
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